Publications

SnO deposition via water based ALD employing tin(ii) formamidinate: precursor characterization and process development

Huster, N. and Ghiyasi, R. and Zanders, D. and Rogalla, D. and Karppinen, M. and Devi, A.

DALTON TRANSACTIONS
Volume: 51 Pages: 14970-14979
DOI: 10.1039/d2dt02562k
Published: 2022

Abstract

« back