Publications

Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application

Neubieser, R.-M. and Wree, J.-L. and Jagosz, J. and Becher, M. and Ostendorf, A. and Devi, A. and Bock, C. and Michel, M. and Grabmaier, A.

MICRO AND NANO ENGINEERING
Volume: 15 Pages:
DOI: 10.1016/j.mne.2022.100126
Published: 2022

Abstract

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