Ultraviolet/vacuum-ultraviolet emission from a high power magnetron sputtering plasma with an aluminum target

Iglesias, E.J. and Hecimovic, A. and Mitschker, F. and Fiebrandt, M. and Bibinov, N. and Awakowicz, P.

Volume: 53 Pages:
DOI: 10.1088/1361-6463/ab52f8
Published: 2020

We report the in situ measurement of the ultraviolet/vacuum-ultraviolet (UV/VUV) emission from a plasma produced by high power impulse magnetron sputtering with aluminum target, using argon as background gas. The UV/VUV detection system is based upon the quantification of the re-emitted fluorescence from a sodium salicylate layer that is placed in a housing inside the vacuum chamber, at 11 cm from the center of the cathode. The detector is equipped with filters that allow for differentiating various spectral regions, and with a front collimating tube that provides a spatial resolution ≈ 0.5 cm. Using various views of the plasma, the measured absolutely calibrated photon rates enable to calculate emissivities and irradiances based on a model of the ionization region. We present results that demonstrate that Al+ ions are responsible for most of the VUV irradiance. We also discuss the photoelectric emission due to irradiances on the target ∼ 2 × 1018 s-1 . cm-2 produced by high energy photons from resonance lines of Ar+. © 2019 IOP Publishing Ltd.

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