Structural and Functional Properties of the Thin Film System Ti-Ni-Si

Wambach, M. and Ziolkowski, P. and Müller, E. and Ludwig, Al.

Volume: 21 Pages: 362-369
DOI: 10.1021/acscombsci.8b00181
Published: 2019

The thin film system Ti-Ni-Si was investigated using methods of combinatorial materials science. A thin film composition spread library of the system was fabricated using combinatorial magnetron sputtering. The functional properties Seebeck coefficient, electrical resistivity, and luminance were determined using high-throughput characterization techniques. A thin-film phase diagram was established by the assessment of high-throughput X-ray diffraction results. Correlations between composition, phase constitution, and functional properties with focus on the binary composition space are discussed. © Copyright 2019 American Chemical Society.

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