Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis

Hirst, J. and Müller, S. and Peeters, D. and Sadlo, A. and Mai, L. and Reyes, O.M. and Friedrich, D. and Mitoraj, D. and Devi, A. and Beranek, R. and Eichberger, R.

Volume: Pages:
DOI: 10.1515/zpch-2019-1485
Published: 2019

The temporal evolution of photogenerated carriers in CuWO4, CuO and WO3 thin films deposited via a direct chemical vapor deposition approach was studied using time-resolved microwave conductivity and terahertz spectroscopy to obtain the photocarrier lifetime, mobility and diffusion length. The carrier transport properties of the films prepared by varying the copper-to-tungsten stoichiometry were compared and the results related to the performance of the compositions built into respective photoelectrochemical cells. Superior carrier mobility was observed for CuWO4 under frontside illumination. © 2019 Walter de Gruyter GmbH, Berlin/Boston.

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